Altered thymidylate kinase substrate specificity in mammalian cells selected for resistance to iododeoxyuridine
A clone of Syrian hamster melanoma cells was selected for resistance to high levels of the thymidine (dT) analog 5-iododeoxyuridine (IdU). Unlike cell lines previously isolated as IdU resistant (IdU r), these IdU r lines had normal levels of thymidine kinase (EC 2.7.1.21) activity, grew in HAT mediu...
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Veröffentlicht in: | Experimental cell research 1979-10, Vol.123 (2), p.355-363 |
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Sprache: | eng |
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Zusammenfassung: | A clone of Syrian hamster melanoma cells was selected for resistance to high levels of the thymidine (dT) analog 5-iododeoxyuridine (IdU). Unlike cell lines previously isolated as IdU resistant (IdU
r), these IdU
r lines had normal levels of thymidine kinase (EC 2.7.1.21) activity, grew in HAT medium, and readily incorporated exogenous dT and 5-bromodeoxyuridine (BrdU) into DNA. However, these IdU
r cells were found to preferentially exclude IdU from their DNA. Analyses of the soluble nucleotide pools of the IdU
r cells showed that they were able to take up and phosphorylate exogenous dT as well as the wild-type cells, and both mutant and wild-type cells accumulated dTTP as the major phosphorylated component. In contrast, while the wild-type cells in the presence of exogenous IdU accumulated significant levels of IdUTP (as well as IdUMP), the IdU
r cells accumulated only IdUMP. Thus, the mutant cells appear to have a markedly decreased ability to phosphorylate IdU beyond the monophosphate level. Assays of thymidylate kinase (EC 2.7.4.9) activity in extracts of the IdU
r cells indicated a marked preference for dTMP as substrate over IdUMP (in comparison to the wild-type enzyme activity). The cell lines described in this study represent a new phenotype arising from selection for resistance to a halogenated dT analog. The resistance appears to involve a change in the substrate specificity of thymidylate kinase, such that the enzyme in the IdU
r cells has an enhanced ability to discriminate between very closely related compounds. |
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ISSN: | 0014-4827 1090-2422 |
DOI: | 10.1016/0014-4827(79)90477-4 |