Evolution of the corrosion process on thin-film media

Thin-film hard disks were exposed to elevated temperature/humidity, and dilute acidic vapor environment. These tests are designed to simulate possible galvanic corrosion, which, for the thin-film media, is characterized by the formation of Co and Ni containing corrosion nodules. The evolution of the corrosion process was elucidated by inducing different degrees of corrosion on the media, and these distinct corrosion stages were characterized morphologically by Scanning electron microscopy and chemically by Auger electron spectroscopy compositional analysis. In addition, an x-ray photoelectron spectroscopy chemical state study on the reactivity of Co, Cr, and Ni to ambient and chlorinated environments was conducted. A probable galvanic corrosion mechanism is proposed to understand the chemistry observed during the evolution of the corrosion process. In particular, the effects of ionic contaminants as corrosion accelerators and the role of the Cr underlayer as a corrosion-preventing barrier layer are discussed.