Modulated photothermal reflectance on porous silicon

In this paper we present for the first time results of the application of the modulated photothermal reflectance technique to porous silicon (PS) samples with various degrees of porosity obtained by means of electrochemical dissolution of p t- and p + c-Si substrates. Frequency scans yield results w...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Thin solid films 1995-01, Vol.255 (1), p.111-114
Hauptverfasser: Amato, G., Boarino, L., Benedetto, G., Spagnolo, R.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In this paper we present for the first time results of the application of the modulated photothermal reflectance technique to porous silicon (PS) samples with various degrees of porosity obtained by means of electrochemical dissolution of p t- and p + c-Si substrates. Frequency scans yield results which are strongly related to the thermal conductivity, carrier lifetime and surface recombination velocity of PS. A model accounting for these effects has been developed in order to yield a quantitative evaluation of parameters which are of capital importance in both the physics and technology of PS.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(94)05633-O