Effects of argon addition on a-CN sub(x) film deposition by hot carbon filament chemical vapor deposition

The effects of an argon addition on the microstructure and the interface composition between a-CN sub(x) films and Si substrates were studied by heating the carbon filament both in nitrogen and a mixture of nitrogen and argon gases. FESEM observations revealed that the films prepared in pure nitrogen atmosphere show uniform nucleation and a columnar structure. However, the films prepared in the mixture of nitrogen and argon gases show preferential nucleation and a tapered structure. Depth profiles of carbon, nitrogen, and silicon revealed that the film prepared in pure nitrogen has a broad interface.