AFM fabrication and characterization of nanoscale Al2O3 patterns
In this paper the atomic force microscopy (AFM) fabrication of nanoscale Al 2 O 3 patterns were studied. Nanowire, rings, dot array and pattern were fabricated on Si substrates with SiO 2 surface layer. The effects of applied voltage and scanning speed on obtained Al 2 O 3 pattern were evaluated and...
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| Veröffentlicht in: | Journal of materials science. Materials in electronics 2009-02, Vol.20 (2), p.177-180 |
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| container_end_page | 180 |
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| container_issue | 2 |
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| container_title | Journal of materials science. Materials in electronics |
| container_volume | 20 |
| creator | Jiao, Zheng Zhang, Haijiao Wu, Minghong Guo, Huijiao Wang, Jia Zhao, Bing Ding, Guoji |
| description | In this paper the atomic force microscopy (AFM) fabrication of nanoscale Al
2
O
3
patterns were studied. Nanowire, rings, dot array and pattern were fabricated on Si substrates with SiO
2
surface layer. The effects of applied voltage and scanning speed on obtained Al
2
O
3
pattern were evaluated and the anodic oxidation mechanism was discussed. |
| doi_str_mv | 10.1007/s10854-008-9678-1 |
| format | Article |
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2
O
3
patterns were studied. Nanowire, rings, dot array and pattern were fabricated on Si substrates with SiO
2
surface layer. The effects of applied voltage and scanning speed on obtained Al
2
O
3
pattern were evaluated and the anodic oxidation mechanism was discussed.</description><identifier>ISSN: 0957-4522</identifier><identifier>EISSN: 1573-482X</identifier><identifier>DOI: 10.1007/s10854-008-9678-1</identifier><language>eng</language><publisher>Boston: Springer US</publisher><subject>Applied sciences ; Atoms & subatomic particles ; Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Cross-disciplinary physics: materials science; rheology ; Electronics ; Exact sciences and technology ; Materials ; Materials Science ; Nanoscale materials and structures: fabrication and characterization ; Optical and Electronic Materials ; Physics ; Quantum wires</subject><ispartof>Journal of materials science. Materials in electronics, 2009-02, Vol.20 (2), p.177-180</ispartof><rights>Springer Science+Business Media, LLC 2008</rights><rights>2009 INIST-CNRS</rights><rights>Springer Science+Business Media, LLC 2009</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c373t-363d90b839b7369ff3ed5c7f172cb4be9962b14e098b57bac0e0ae385df30a813</citedby><cites>FETCH-LOGICAL-c373t-363d90b839b7369ff3ed5c7f172cb4be9962b14e098b57bac0e0ae385df30a813</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s10854-008-9678-1$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s10854-008-9678-1$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=21273547$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Jiao, Zheng</creatorcontrib><creatorcontrib>Zhang, Haijiao</creatorcontrib><creatorcontrib>Wu, Minghong</creatorcontrib><creatorcontrib>Guo, Huijiao</creatorcontrib><creatorcontrib>Wang, Jia</creatorcontrib><creatorcontrib>Zhao, Bing</creatorcontrib><creatorcontrib>Ding, Guoji</creatorcontrib><title>AFM fabrication and characterization of nanoscale Al2O3 patterns</title><title>Journal of materials science. Materials in electronics</title><addtitle>J Mater Sci: Mater Electron</addtitle><description>In this paper the atomic force microscopy (AFM) fabrication of nanoscale Al
2
O
3
patterns were studied. Nanowire, rings, dot array and pattern were fabricated on Si substrates with SiO
2
surface layer. The effects of applied voltage and scanning speed on obtained Al
2
O
3
pattern were evaluated and the anodic oxidation mechanism was discussed.</description><subject>Applied sciences</subject><subject>Atoms & subatomic particles</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Materials</subject><subject>Materials Science</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Optical and Electronic Materials</subject><subject>Physics</subject><subject>Quantum wires</subject><issn>0957-4522</issn><issn>1573-482X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNp1kEFLwzAUx4MoOKcfwFsRxFP1JWma5OYYToXJLgreQpIm2tGlM-kO-ult6VAQPD147_f-_PkhdI7hGgPwm4RBsCIHELksucjxAZpgxmleCPJ6iCYgGc8LRsgxOklpDQBlQcUE3c4WT5nXJtZWd3UbMh2qzL7rqG3nYv01LlufBR3aZHXjsllDVjTb6q4HQjpFR143yZ3t5xS9LO6e5w_5cnX_OJ8tc0s57XJa0kqCEVQaTkvpPXUVs9xjTqwpjJOyJAYXDqQwjBttwYF2VLDKU9AC0ym6GnO3sf3YudSpTZ2saxodXLtLihe05Bgk78mLP-S63cXQl1NC4JIVvGenCI-QjW1K0Xm1jfVGx0-FQQ1G1WhU9UbVYFQNFS73wXow4aMOtk4_jwQTTvv0niMjl_pTeHPxt8D_4d8AEYRc</recordid><startdate>20090201</startdate><enddate>20090201</enddate><creator>Jiao, Zheng</creator><creator>Zhang, Haijiao</creator><creator>Wu, Minghong</creator><creator>Guo, Huijiao</creator><creator>Wang, Jia</creator><creator>Zhao, Bing</creator><creator>Ding, Guoji</creator><general>Springer US</general><general>Springer</general><general>Springer Nature B.V</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>F28</scope><scope>FR3</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>L7M</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>S0W</scope><scope>7QF</scope><scope>7QQ</scope></search><sort><creationdate>20090201</creationdate><title>AFM fabrication and characterization of nanoscale Al2O3 patterns</title><author>Jiao, Zheng ; Zhang, Haijiao ; Wu, Minghong ; Guo, Huijiao ; Wang, Jia ; Zhao, Bing ; Ding, Guoji</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c373t-363d90b839b7369ff3ed5c7f172cb4be9962b14e098b57bac0e0ae385df30a813</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Applied sciences</topic><topic>Atoms & subatomic particles</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry and Materials Science</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Materials</topic><topic>Materials Science</topic><topic>Nanoscale materials and structures: fabrication and characterization</topic><topic>Optical and Electronic Materials</topic><topic>Physics</topic><topic>Quantum wires</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jiao, Zheng</creatorcontrib><creatorcontrib>Zhang, Haijiao</creatorcontrib><creatorcontrib>Wu, Minghong</creatorcontrib><creatorcontrib>Guo, Huijiao</creatorcontrib><creatorcontrib>Wang, Jia</creatorcontrib><creatorcontrib>Zhao, Bing</creatorcontrib><creatorcontrib>Ding, Guoji</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>Advanced Technologies & Aerospace Collection</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Advanced Technologies & Aerospace Database</collection><collection>ProQuest Advanced Technologies & Aerospace Collection</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>DELNET Engineering & Technology Collection</collection><collection>Aluminium Industry Abstracts</collection><collection>Ceramic Abstracts</collection><jtitle>Journal of materials science. Materials in electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Jiao, Zheng</au><au>Zhang, Haijiao</au><au>Wu, Minghong</au><au>Guo, Huijiao</au><au>Wang, Jia</au><au>Zhao, Bing</au><au>Ding, Guoji</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>AFM fabrication and characterization of nanoscale Al2O3 patterns</atitle><jtitle>Journal of materials science. Materials in electronics</jtitle><stitle>J Mater Sci: Mater Electron</stitle><date>2009-02-01</date><risdate>2009</risdate><volume>20</volume><issue>2</issue><spage>177</spage><epage>180</epage><pages>177-180</pages><issn>0957-4522</issn><eissn>1573-482X</eissn><abstract>In this paper the atomic force microscopy (AFM) fabrication of nanoscale Al
2
O
3
patterns were studied. Nanowire, rings, dot array and pattern were fabricated on Si substrates with SiO
2
surface layer. The effects of applied voltage and scanning speed on obtained Al
2
O
3
pattern were evaluated and the anodic oxidation mechanism was discussed.</abstract><cop>Boston</cop><pub>Springer US</pub><doi>10.1007/s10854-008-9678-1</doi><tpages>4</tpages></addata></record> |
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| ispartof | Journal of materials science. Materials in electronics, 2009-02, Vol.20 (2), p.177-180 |
| issn | 0957-4522 1573-482X |
| language | eng |
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| subjects | Applied sciences Atoms & subatomic particles Characterization and Evaluation of Materials Chemistry and Materials Science Cross-disciplinary physics: materials science rheology Electronics Exact sciences and technology Materials Materials Science Nanoscale materials and structures: fabrication and characterization Optical and Electronic Materials Physics Quantum wires |
| title | AFM fabrication and characterization of nanoscale Al2O3 patterns |
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