Properties of Amorphous Carbon Thin Films for Solar Cell Applications
This paper is presented the properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal-CVD) method at various deposition temperatures. The surface morphology, electrica...
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Veröffentlicht in: | ICAMN 2007 2007-05, Vol.1217, p.140-146 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | This paper is presented the properties of amorphous carbon (a-C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal-CVD) method at various deposition temperatures. The surface morphology, electrical properties and crystallinity of these films have been studied using Analytical Scanning Electron Microscope (SEM) JEOL JSM-6360LA, Current Voltage (I-V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software) and the D5000 Siemen Difractrometer (XRD) respectively. It was found that increasing deposition temperature had the most influence on the a-C thin films properties. In addition the carrier gas flow also showed a secondary impact on the properties of a-C thin films. |
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ISSN: | 0094-243X |