Phase formation and microstructure in sputter-deposited Ti-Mo-C and Ti-W-C thin films

Ti-Mo-C and Ti-W-C films were deposited by cosputtering from carbide targets in order to examine the phase formation, microstructure, and mechanical properties. A series of Ti-Mo-C films were deposited, with compositions ranging from TiC to Mo2C. The X-ray diffraction (XRD) analysis showed that mult...

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Veröffentlicht in:	Metallurgical and materials transactions. A, Physical metallurgy and materials science Physical metallurgy and materials science, 2002-06, Vol.33 (6), p.1579-1588
Hauptverfasser:	KOUTZAKI, Sirma H, KRZANOWSKI, James E, NAINAPARAMPIL, Jose J
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Cross-disciplinary physics: materials science rheology Deposition by sputtering Electrons Exact sciences and technology Materials science Metallurgy Metals Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics
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Beschreibung
Zusammenfassung:	Ti-Mo-C and Ti-W-C films were deposited by cosputtering from carbide targets in order to examine the phase formation, microstructure, and mechanical properties. A series of Ti-Mo-C films were deposited, with compositions ranging from TiC to Mo2C. The X-ray diffraction (XRD) analysis showed that multiphase Ti-Mo-C films, containing the (Ti,Mo)C, Mo2C, and Mo3C2 phases, were only obtained in highly Mo-rich films.
ISSN:	1073-5623 1543-1940
DOI:	10.1007/s11661-002-0168-4