Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist

Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist

The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresi...

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Veröffentlicht in:Applied Optics 1977-06, Vol.16 (6), p.1633-1635
Hauptverfasser: Livanos, A C, Katzir, A, Shellan, J B, Yariv, A
Format: Artikel
Sprache:eng
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Zusammenfassung:The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 A +/- 5 A/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.
ISSN:1559-128X
0003-6935
1539-4522
DOI:10.1364/ao.16.001633