Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology

The recent interest in extreme-ultraviolet (EUV) lithography has led to the development of an array of at-wavelength metrologies implemented on synchrotron beamlines. These beamlines commonly use Kirkpatrick-Baez (K-B) systems consisting of two perpendicular, elliptically bent mirrors in series. To...

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Veröffentlicht in:	Applied Optics 2001-08, Vol.40 (22), p.3703-3709
Hauptverfasser:	Naulleau, P P, Goldberg, K A, Batson, P J, Jeong, S, Underwood, J H
Format:	Artikel
Sprache:	eng
Schlagworte:	BEAM OPTICS EXTREME ULTRAVIOLET RADIATION PARTICLE ACCELERATORS SYNCHROTRONS TOLERANCE
Online-Zugang:	Volltext
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