Ion assisted deposition of optical and protective coatings for heavy metal fluoride glass

Although attractive for optical applications in the near-uv-through-ir regions, many compositions are relatively soft, hygroscopic, and possess low softening points (250- 300 degrees C). IAD- deposited MgF sub 2 , SiO sub 2 , and Al sub 2 O sub 3 /SiO sub 2 thin-film structures on glass substrates a...

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Veröffentlicht in:	Appl. Opt.; (United States) 1986-06, Vol.25 (12), p.1973-1976
Hauptverfasser:	MCNALLY, J. J, AL-JUMAILY, G. A, MCNEIL, J. R, BENDOW, B
Format:	Artikel
Sprache:	eng
Schlagworte:	360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication 360601 - Other Materials- Preparation & Manufacture 420300 - Engineering- Lasers- (-1989) 640301 - Atomic, Molecular & Chemical Physics- Beams & their Reactions ALKALINE EARTH METAL COMPOUNDS ALUMINIUM COMPOUNDS ALUMINIUM OXIDES ANTIREFLECTION COATINGS ARGON IONS BEAMS CHALCOGENIDES CHARGED PARTICLES CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS COATINGS DEPOSITION ENERGY BEAM DEPOSITION ENGINEERING Exact sciences and technology FLUORIDES FLUORINE COMPOUNDS Fundamental areas of phenomenology (including applications) GLASS HALIDES HALOGEN COMPOUNDS ION BEAMS IONS LASER MATERIALS MAGNESIUM COMPOUNDS MAGNESIUM FLUORIDES MATERIALS MATERIALS SCIENCE Optical materials OPTICAL PROPERTIES Optics OXIDES OXYGEN COMPOUNDS PHYSICAL PROPERTIES Physics PROTECTIVE COATINGS SILICON COMPOUNDS SILICON OXIDES SUBSTRATES SURFACE COATING
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Beschreibung
Zusammenfassung:	Although attractive for optical applications in the near-uv-through-ir regions, many compositions are relatively soft, hygroscopic, and possess low softening points (250- 300 degrees C). IAD- deposited MgF sub 2 , SiO sub 2 , and Al sub 2 O sub 3 /SiO sub 2 thin-film structures on glass substrates at approximately 100 degrees improved environmental durability of the glass and had reasonably good optical characteristics; without IAD the coatings were not durable and had poor adhesion.
ISSN:	0003-6935 1559-128X 1539-4522
DOI:	10.1364/ao.25.001973