Silicon optical waveguides with buried-CoSi(2) cladding layers

Silicon optical waveguides with buried-CoSi(2) cladding layers

We report a new Si waveguide that has a buried, metallike cladding. Infrared light propagates in a crystal Si layer atop a 50-nm film of buried CoSi(2) formed by implantation. Experiments in a 20-microm Si structure at the 1.3-microm wavelength show propagation losses below 2.5 dB/cm for TE(0) and T...

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Veröffentlicht in:Optics letters 1994-09, Vol.19 (17), p.1319-1321
Hauptverfasser: Soref, R A, Namavar, F, Kalkhoran, N M, Koker, D M
Format: Artikel
Sprache:eng
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Zusammenfassung:We report a new Si waveguide that has a buried, metallike cladding. Infrared light propagates in a crystal Si layer atop a 50-nm film of buried CoSi(2) formed by implantation. Experiments in a 20-microm Si structure at the 1.3-microm wavelength show propagation losses below 2.5 dB/cm for TE(0) and TM(0). Results agree with theory. We also constructed two vertically integrated Si slab waveguides bounded below by CoSi(2) cladding layers.
ISSN:0146-9592