Dielectric function of sputter-deposited silicon dioxide and silicon nitride films in the thermal infrared

Dielectric function of sputter-deposited silicon dioxide and silicon nitride films in the thermal infrared

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Veröffentlicht in:Applied Optics 1985-03, Vol.24 (6), p.745-746
Hauptverfasser: ERIKSSON, T. S, JIANG, S, GRANQVIST, C. G
Format: Artikel
Sprache:eng
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Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
Infrared and raman spectra and scattering
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Physics
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container_title Applied Optics
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creator ERIKSSON, T. S
JIANG, S
GRANQVIST, C. G
description
doi_str_mv 10.1364/ao.24.000745
format Article
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ispartof Applied Optics, 1985-03, Vol.24 (6), p.745-746
issn 0003-6935
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1539-4522
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source Alma/SFX Local Collection; Optica Publishing Group Journals
subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
Infrared and raman spectra and scattering
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Physics
title Dielectric function of sputter-deposited silicon dioxide and silicon nitride films in the thermal infrared
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