Investigation of phase-growth kinetics during interaction of silicon single crystals and molybdenum thin films

Investigation of the phase-growth kinetics and identification of the phases formed as a result of reactive diffusion in the system of Si single crystals and Mo thin films, has been carried out by electrochemical anodic etching.

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Veröffentlicht in:Talanta (Oxford) 1977, Vol.24 (3), p.192-194
Hauptverfasser: Fomin, B.I., Gershinskii, A.E., Cherepov, E.I.
Format: Artikel
Sprache:eng
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Zusammenfassung:Investigation of the phase-growth kinetics and identification of the phases formed as a result of reactive diffusion in the system of Si single crystals and Mo thin films, has been carried out by electrochemical anodic etching.
ISSN:0039-9140
1873-3573
DOI:10.1016/0039-9140(77)80091-X