Formation of a Non-Thickness-Limited Titanium Dioxide Mesosponge and its Use in Dye-Sensitized Solar Cells

Etch a sketch: Robust TiO2 mesoporous layers can be fabricated on Ti surfaces by a combination of non‐thickness‐limited anodization and selective etching. Layers more than 50 μm thick with highly regular feature and pore sizes in the range 5–10 nm can be produced (see picture, FTO=fluorine doped tin oxide). The layers are highly flexible, well‐adhered, and can be used directly after appropriate annealing in efficient dye‐sensitized solar cells.