Matrix-Free Laser Desorption/Ionization Mass Spectrometry on Silicon Nanowire Arrays Prepared by Chemical Etching of Crystalline Silicon

This paper reports on the use of silicon nanowires (SiNWs), easily prepared in a single step by chemical etching of crystalline silicon in HF/AgNO3 aqueous solution, as a highly sensitive substrate for laser desorption/ionization mass spectrometry (LDI-MS) analysis. The SiNWs' diameter and leng...

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Veröffentlicht in:Langmuir 2010-01, Vol.26 (2), p.1354-1361
Hauptverfasser: Piret, Gaëlle, Drobecq, Hervé, Coffinier, Yannick, Melnyk, Oleg, Boukherroub, Rabah
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Sprache:eng
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Zusammenfassung:This paper reports on the use of silicon nanowires (SiNWs), easily prepared in a single step by chemical etching of crystalline silicon in HF/AgNO3 aqueous solution, as a highly sensitive substrate for laser desorption/ionization mass spectrometry (LDI-MS) analysis. The SiNWs' diameter and length depend on the etchant concentration and dissolution time. Optimized LDI substrate consists of nanowires with an average diameter in the range of 20−100 nm and 2.5 μm in length. The optimized SiNWs' surface morphology coupled to a controlled surface chemistry allowed a significant LDI-MS performance through measurements of a broad range of analytes, including small molecules, peptides, and a bovine serum albumin (BSA) digest. A signal-to-noise ratio of 250 was ascertained for a 10 fmol bradykinin pick, in reflector mode acquisition. Likewise, the sutent, a small tyrosine kinase inhibitor, could be observed down to 10 fmol, as compared to 500 fmol limit detection using the classical matrix-assisted laser desorption/ionization mass spectrometry (MALDI-MS). We have further investigated the optical properties of the nanowires, and our results suggest that they have a small or no effect on the desorption/ionization (D/I) process. On the contrary, the surface morphology and thermal properties of the silicon nanostructures are found to be the essential features contributing to the D/I performance.
ISSN:0743-7463
1520-5827
DOI:10.1021/la902266x