Molecular beam deposited bistable interference filters

Ultrahigh vacuum and molecular beam deposition techniques have been used to fabricate ZnSe interference filters. These demonstrate optical bistability with critical switching power being measured at five wavelengths between 521 and 676 nm. These filters demonstrate considerably improved long term op...

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Veröffentlicht in:Applied Optics 1989-07, Vol.28 (14), p.2796-2799
Hauptverfasser: MUIRHEAD, I. T, MILLER, A, LEWIS, K. L, STAROMLYNSKA, J, WELFORD, K
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Sprache:eng
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Zusammenfassung:Ultrahigh vacuum and molecular beam deposition techniques have been used to fabricate ZnSe interference filters. These demonstrate optical bistability with critical switching power being measured at five wavelengths between 521 and 676 nm. These filters demonstrate considerably improved long term operation stability over that offered by samples deposited using conventional thermal evaporation. Both dispersive and absorptive bistability could be demonstrated in the same sample.
ISSN:0003-6935
1559-128X
1539-4522
DOI:10.1364/AO.28.002796