Extreme UV and X-ray scattering measurements from a rough LiF crystal surface characterized by electron micrography

XUV and x-ray scattering by a LiF crystal is measured. The angular distribution of the scattered radiation (ADSR) reveals characteristic features, side peaks or asymmetry. The surface of the sample is statistically characterized by a microdensitometer analysis of electron micrographs resolving the s...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied Optics 1989-05, Vol.28 (10), p.1763-1772
Hauptverfasser: NAJIB ALEHYANE, MOHAMMED ARBAOUI, BARCHEWITZ, R, ANDRE, J.-M, CHRISTENSEN, F. E, HORNSTRUP, A, PALMARI, J, RASIGNI, M, RIVOIRA, R, RASIGNI, G
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:XUV and x-ray scattering by a LiF crystal is measured. The angular distribution of the scattered radiation (ADSR) reveals characteristic features, side peaks or asymmetry. The surface of the sample is statistically characterized by a microdensitometer analysis of electron micrographs resolving the short spatial wavelengths of the surface roughness. This analysis shows that the surface has a large microroughness with an autocovariance function which is Gaussian in its initial portion. The first-order perturbation vector theory of the roughness-induced scattering leads to an interpretation of the ADSR features in terms of the modulation of the surface power spectral density function associated with the microroughness by an optical factor. The possibility of obtaining short scale roughness characterization from XUV or x-ray measurements is discussed.
ISSN:0003-6935
1559-128X
1539-4522
DOI:10.1364/AO.28.001763