Near-infrared double negative metamaterials

Near-infrared double negative metamaterials

We numerically demonstrate a metamaterial with both negative epsilon and negative mu over an overlapping near-infrared wavelength range resulting in a low loss negative-index material. Parametric studies optimizing this negative index are presented. This structure can be easily fabricated with stand...

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Veröffentlicht in:Optics express 2005-06, Vol.13 (13), p.4922-4930
Hauptverfasser: Zhang, Shuang, Fan, Wenjun, Malloy, K J, Brueck, S R, Panoiu, N C, Osgood, R M
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Sprache:eng
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Zusammenfassung:We numerically demonstrate a metamaterial with both negative epsilon and negative mu over an overlapping near-infrared wavelength range resulting in a low loss negative-index material. Parametric studies optimizing this negative index are presented. This structure can be easily fabricated with standard semiconductor processing techniques.
ISSN:1094-4087
1094-4087
DOI:10.1364/OPEX.13.004922