Novel germanium-based magnetic semiconductors

Epitaxial synthesis and properties of novel Co and Mn-doped Ge magnetic semiconductors were studied. Epitaxial growth of high quality films with high doping concentrations has been stabilized by the use of two dopants. The magnetic and transport properties of the system exhibit high T(C) and large m...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Phys. Rev. Lett 2003-10, Vol.91 (17), p.177203-177203, Article 177203
Hauptverfasser: Tsui, F, He, L, Ma, L, Tkachuk, A, Chu, Y S, Nakajima, K, Chikyow, T
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 177203
container_issue 17
container_start_page 177203
container_title Phys. Rev. Lett
container_volume 91
creator Tsui, F
He, L
Ma, L
Tkachuk, A
Chu, Y S
Nakajima, K
Chikyow, T
description Epitaxial synthesis and properties of novel Co and Mn-doped Ge magnetic semiconductors were studied. Epitaxial growth of high quality films with high doping concentrations has been stabilized by the use of two dopants. The magnetic and transport properties of the system exhibit high T(C) and large magnetoresistance effects that can be controlled systematically by the doping concentration. The maximum T(C) achieved in the semiconducting materials is approximately 270 K at a composition of Co0.12Mn0.03Ge0.85.
doi_str_mv 10.1103/physrevlett.91.177203
format Article
fullrecord <record><control><sourceid>proquest_osti_</sourceid><recordid>TN_cdi_proquest_miscellaneous_71399075</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>71399075</sourcerecordid><originalsourceid>FETCH-LOGICAL-c446t-8f820a32e76fbf71de46d8d468319e12f4e853efc47abfb4fef584aa3c3455e63</originalsourceid><addsrcrecordid>eNpFkFtLw0AQhRdRbK3-BKUg-JY6k70ljyLeoKiIPi-bzWwbyaVmN4X-eyMt-HRevjNz-Bi7RFggAr_drHehp21NMS5yXKDWKfAjNkXQeaIRxTGbAnBMcgA9YWchfAMApio7ZRMUCpFrMWXJa7eler6ivrFtNTRJYQOV88auWoqVmwdqKte15eBi14dzduJtHejikDP29fjwef-cLN-eXu7vlokTQsUk81kKlqeklS-8xpKEKrNSqIxjTph6QZnk5J3QtvCF8ORlJqzljgspSfEZu97f7UKsTHBVJLceZ7TkokEJIKUSI3WzpzZ99zNQiKapgqO6ti11QzAaeZ6DliMo96DruzBa82bTV43tdwbB_Nk076PND9ouR5smR7O3OfauDg-GoqHyv3XQx38Bs_5zdA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>71399075</pqid></control><display><type>article</type><title>Novel germanium-based magnetic semiconductors</title><source>American Physical Society Journals</source><creator>Tsui, F ; He, L ; Ma, L ; Tkachuk, A ; Chu, Y S ; Nakajima, K ; Chikyow, T</creator><creatorcontrib>Tsui, F ; He, L ; Ma, L ; Tkachuk, A ; Chu, Y S ; Nakajima, K ; Chikyow, T ; National Institute for Material Science (US) ; Univ. of North Carolina (US) ; Advanced Photon Source, Argonne National Lab., IL (US)</creatorcontrib><description>Epitaxial synthesis and properties of novel Co and Mn-doped Ge magnetic semiconductors were studied. Epitaxial growth of high quality films with high doping concentrations has been stabilized by the use of two dopants. The magnetic and transport properties of the system exhibit high T(C) and large magnetoresistance effects that can be controlled systematically by the doping concentration. The maximum T(C) achieved in the semiconducting materials is approximately 270 K at a composition of Co0.12Mn0.03Ge0.85.</description><identifier>ISSN: 0031-9007</identifier><identifier>EISSN: 1079-7114</identifier><identifier>DOI: 10.1103/physrevlett.91.177203</identifier><identifier>PMID: 14611374</identifier><language>eng</language><publisher>United States</publisher><subject>ADVANCED PHOTON SOURCE ; FABRICATION ; GERMANIUM ALLOYS ; MAGNETIC SEMICONDUCTORS ; MATERIALS SCIENCE</subject><ispartof>Phys. Rev. Lett, 2003-10, Vol.91 (17), p.177203-177203, Article 177203</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c446t-8f820a32e76fbf71de46d8d468319e12f4e853efc47abfb4fef584aa3c3455e63</citedby><cites>FETCH-LOGICAL-c446t-8f820a32e76fbf71de46d8d468319e12f4e853efc47abfb4fef584aa3c3455e63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,881,2863,2864,27901,27902</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/14611374$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/15005564$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Tsui, F</creatorcontrib><creatorcontrib>He, L</creatorcontrib><creatorcontrib>Ma, L</creatorcontrib><creatorcontrib>Tkachuk, A</creatorcontrib><creatorcontrib>Chu, Y S</creatorcontrib><creatorcontrib>Nakajima, K</creatorcontrib><creatorcontrib>Chikyow, T</creatorcontrib><creatorcontrib>National Institute for Material Science (US)</creatorcontrib><creatorcontrib>Univ. of North Carolina (US)</creatorcontrib><creatorcontrib>Advanced Photon Source, Argonne National Lab., IL (US)</creatorcontrib><title>Novel germanium-based magnetic semiconductors</title><title>Phys. Rev. Lett</title><addtitle>Phys Rev Lett</addtitle><description>Epitaxial synthesis and properties of novel Co and Mn-doped Ge magnetic semiconductors were studied. Epitaxial growth of high quality films with high doping concentrations has been stabilized by the use of two dopants. The magnetic and transport properties of the system exhibit high T(C) and large magnetoresistance effects that can be controlled systematically by the doping concentration. The maximum T(C) achieved in the semiconducting materials is approximately 270 K at a composition of Co0.12Mn0.03Ge0.85.</description><subject>ADVANCED PHOTON SOURCE</subject><subject>FABRICATION</subject><subject>GERMANIUM ALLOYS</subject><subject>MAGNETIC SEMICONDUCTORS</subject><subject>MATERIALS SCIENCE</subject><issn>0031-9007</issn><issn>1079-7114</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNpFkFtLw0AQhRdRbK3-BKUg-JY6k70ljyLeoKiIPi-bzWwbyaVmN4X-eyMt-HRevjNz-Bi7RFggAr_drHehp21NMS5yXKDWKfAjNkXQeaIRxTGbAnBMcgA9YWchfAMApio7ZRMUCpFrMWXJa7eler6ivrFtNTRJYQOV88auWoqVmwdqKte15eBi14dzduJtHejikDP29fjwef-cLN-eXu7vlokTQsUk81kKlqeklS-8xpKEKrNSqIxjTph6QZnk5J3QtvCF8ORlJqzljgspSfEZu97f7UKsTHBVJLceZ7TkokEJIKUSI3WzpzZ99zNQiKapgqO6ti11QzAaeZ6DliMo96DruzBa82bTV43tdwbB_Nk076PND9ouR5smR7O3OfauDg-GoqHyv3XQx38Bs_5zdA</recordid><startdate>20031024</startdate><enddate>20031024</enddate><creator>Tsui, F</creator><creator>He, L</creator><creator>Ma, L</creator><creator>Tkachuk, A</creator><creator>Chu, Y S</creator><creator>Nakajima, K</creator><creator>Chikyow, T</creator><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>OTOTI</scope></search><sort><creationdate>20031024</creationdate><title>Novel germanium-based magnetic semiconductors</title><author>Tsui, F ; He, L ; Ma, L ; Tkachuk, A ; Chu, Y S ; Nakajima, K ; Chikyow, T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c446t-8f820a32e76fbf71de46d8d468319e12f4e853efc47abfb4fef584aa3c3455e63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>ADVANCED PHOTON SOURCE</topic><topic>FABRICATION</topic><topic>GERMANIUM ALLOYS</topic><topic>MAGNETIC SEMICONDUCTORS</topic><topic>MATERIALS SCIENCE</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tsui, F</creatorcontrib><creatorcontrib>He, L</creatorcontrib><creatorcontrib>Ma, L</creatorcontrib><creatorcontrib>Tkachuk, A</creatorcontrib><creatorcontrib>Chu, Y S</creatorcontrib><creatorcontrib>Nakajima, K</creatorcontrib><creatorcontrib>Chikyow, T</creatorcontrib><creatorcontrib>National Institute for Material Science (US)</creatorcontrib><creatorcontrib>Univ. of North Carolina (US)</creatorcontrib><creatorcontrib>Advanced Photon Source, Argonne National Lab., IL (US)</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>OSTI.GOV</collection><jtitle>Phys. Rev. Lett</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tsui, F</au><au>He, L</au><au>Ma, L</au><au>Tkachuk, A</au><au>Chu, Y S</au><au>Nakajima, K</au><au>Chikyow, T</au><aucorp>National Institute for Material Science (US)</aucorp><aucorp>Univ. of North Carolina (US)</aucorp><aucorp>Advanced Photon Source, Argonne National Lab., IL (US)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Novel germanium-based magnetic semiconductors</atitle><jtitle>Phys. Rev. Lett</jtitle><addtitle>Phys Rev Lett</addtitle><date>2003-10-24</date><risdate>2003</risdate><volume>91</volume><issue>17</issue><spage>177203</spage><epage>177203</epage><pages>177203-177203</pages><artnum>177203</artnum><issn>0031-9007</issn><eissn>1079-7114</eissn><abstract>Epitaxial synthesis and properties of novel Co and Mn-doped Ge magnetic semiconductors were studied. Epitaxial growth of high quality films with high doping concentrations has been stabilized by the use of two dopants. The magnetic and transport properties of the system exhibit high T(C) and large magnetoresistance effects that can be controlled systematically by the doping concentration. The maximum T(C) achieved in the semiconducting materials is approximately 270 K at a composition of Co0.12Mn0.03Ge0.85.</abstract><cop>United States</cop><pmid>14611374</pmid><doi>10.1103/physrevlett.91.177203</doi><tpages>1</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0031-9007
ispartof Phys. Rev. Lett, 2003-10, Vol.91 (17), p.177203-177203, Article 177203
issn 0031-9007
1079-7114
language eng
recordid cdi_proquest_miscellaneous_71399075
source American Physical Society Journals
subjects ADVANCED PHOTON SOURCE
FABRICATION
GERMANIUM ALLOYS
MAGNETIC SEMICONDUCTORS
MATERIALS SCIENCE
title Novel germanium-based magnetic semiconductors
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T11%3A11%3A19IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Novel%20germanium-based%20magnetic%20semiconductors&rft.jtitle=Phys.%20Rev.%20Lett&rft.au=Tsui,%20F&rft.aucorp=National%20Institute%20for%20Material%20Science%20(US)&rft.date=2003-10-24&rft.volume=91&rft.issue=17&rft.spage=177203&rft.epage=177203&rft.pages=177203-177203&rft.artnum=177203&rft.issn=0031-9007&rft.eissn=1079-7114&rft_id=info:doi/10.1103/physrevlett.91.177203&rft_dat=%3Cproquest_osti_%3E71399075%3C/proquest_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=71399075&rft_id=info:pmid/14611374&rfr_iscdi=true