Structural modification on silica glass surface induced by thermal poling for second harmonic generation

O‐K edge XANES spectroscopy evidences structural modification induced by thermal poling treatment in surfaces of bulk Herasil silica glass presenting second harmonic generation. Considering model silicon dioxide clusters, calculations based on full multiple scattering approach have been performed in order to explain accurately the differences observed on XANES spectra at different stage of the poling treatment. These structural modifications on extreme surface affect both network and defects by breaking Si‐O‐Si bridging bonds. Despite of the formation of bridging bond occurring during the thermal depoling ‐which erases the SHG inside the glass‐, the initial structure of the unpoled sample is not reproduced.