A Microwave-Induced Plasma Based on Microstrip Technology and Its Use for the Atomic Emission Spectrometric Determination of Mercury with the Aid of the Cold-Vapor Technique
A new low-power, small-scale 2.45 GHz microwave plasma source at atmospheric pressure for atomic emission spectrometry based on microstrip technology is described. The MicroStrip Plasma (MSP) source was produced in microstrip technology on a fused-silica wafer and designed as an element-selective de...
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Veröffentlicht in: | Analytical chemistry (Washington) 2000-01, Vol.72 (1), p.193-197 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A new low-power, small-scale 2.45 GHz microwave plasma source at atmospheric pressure for atomic emission spectrometry based on microstrip technology is described. The MicroStrip Plasma (MSP) source was produced in microstrip technology on a fused-silica wafer and designed as an element-selective detector for miniaturized analytical applications. The electrodeless microwave-induced plasma (MIP) operates at microwave input power of 10−40 W and gas flows of 50−1000 mL·min-1 of Ar. Rotational (OH) and excitation (Fe) temperatures were found to be 650 and 8000 K, respectively. Spatially resolved measurements of the Hg I 253.7-nm atomic emission line with an electronic slitless spectrograph (ESS) showed that a cylindrically symmetric plasma with a diameter of about 1 mm is obtained. With the MSP, Hg could be determined by applying the flow injection cold vapor (FI-CV) technique with a detection limit of 50 pg·ml-1. In terms of the relative standard deviation, a time stability of |
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ISSN: | 0003-2700 1520-6882 |
DOI: | 10.1021/ac9906476 |