Scanning Probe Lithography of Polymers: Tailoring Morphology and Functionality at the Nanometer Scale

Scanning Probe Lithography of Polymers: Tailoring Morphology and Functionality at the Nanometer Scale

This article reviews the patterning of the polymer via scanning probe lithography (SPL). Several different lithographies are characterized by the source of the patterned material, whether a mechanical, electrical, or thermal field is used, and whether the lithography modifies morphology, functionali...

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Veröffentlicht in:Scanning 2008-03, Vol.30 (2), p.172-183
Hauptverfasser: Lee, Woo-Kyung, Sheehan, Paul E.
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Sprache:eng
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atomic force microscopy
polymers
scanning probe lithography
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description This article reviews the patterning of the polymer via scanning probe lithography (SPL). Several different lithographies are characterized by the source of the patterned material, whether a mechanical, electrical, or thermal field is used, and whether the lithography modifies morphology, functionality, or both. The merits of the different strategies are discussed with respect to the fabrication goals. SCANNING 30: 000–000, 2008. © 2008 Wiley Periodicals, Inc.
doi_str_mv 10.1002/sca.20084
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_70488118</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>32643120</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3924-9ad6d122f2d2f508eacb955cd45b58f97db98232d277b5e2914bd1dde43af813</originalsourceid><addsrcrecordid>eNqF0E1v1DAQBmALUdFt4cAfQD4hcUjrz8ThVi3dgrQtFV2Jo-XEk12DE2_trNr8e1x2CyfEaaSZZ97Di9BbSs4oIew8teaMEaLECzSjNWeFqoR8iWaElrQgQlbH6CSlHyTbWtFX6JiqzCUvZwjuWjMMbljj2xgawEs3bsI6mu1mwqHDt8FPPcT0Ea-M8yE-wesQt5vgw3rCZrB4sRva0YXBeDfmzYjHDeAbM4QeRog453t4jY464xO8OcxTtFpcruafi-XXqy_zi2XR8pqJoja2tJSxjlnWSaLAtE0tZWuFbKTq6so2tWI8X6uqkcBqKhpLrQXBTacoP0Xv97HbGO53kEbdu9SC92aAsEu6IkIpStV_IWel4JSRDD_sYRtDShE6vY2uN3HSlOin7nXuXv_uPtt3h9Bd04P9Kw9lZ3C-Bw_Ow_TvJH03v3iOLPYfLo3w-OfDxJ-6rHgl9febK82-VZ8WsrzWiv8C3S-dVw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>32643120</pqid></control><display><type>article</type><title>Scanning Probe Lithography of Polymers: Tailoring Morphology and Functionality at the Nanometer Scale</title><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Alma/SFX Local Collection</source><creator>Lee, Woo-Kyung ; Sheehan, Paul E.</creator><creatorcontrib>Lee, Woo-Kyung ; Sheehan, Paul E.</creatorcontrib><description>This article reviews the patterning of the polymer via scanning probe lithography (SPL). Several different lithographies are characterized by the source of the patterned material, whether a mechanical, electrical, or thermal field is used, and whether the lithography modifies morphology, functionality, or both. The merits of the different strategies are discussed with respect to the fabrication goals. SCANNING 30: 000–000, 2008. © 2008 Wiley Periodicals, Inc.</description><identifier>ISSN: 0161-0457</identifier><identifier>EISSN: 1932-8745</identifier><identifier>DOI: 10.1002/sca.20084</identifier><identifier>PMID: 18200536</identifier><language>eng</language><publisher>San Francisco: Wiley Subscription Services, Inc., A Wiley Company</publisher><subject>atomic force microscopy ; polymers ; scanning probe lithography</subject><ispartof>Scanning, 2008-03, Vol.30 (2), p.172-183</ispartof><rights>Copyright © 2008 Wiley Periodicals, Inc.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3924-9ad6d122f2d2f508eacb955cd45b58f97db98232d277b5e2914bd1dde43af813</citedby><cites>FETCH-LOGICAL-c3924-9ad6d122f2d2f508eacb955cd45b58f97db98232d277b5e2914bd1dde43af813</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/18200536$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Lee, Woo-Kyung</creatorcontrib><creatorcontrib>Sheehan, Paul E.</creatorcontrib><title>Scanning Probe Lithography of Polymers: Tailoring Morphology and Functionality at the Nanometer Scale</title><title>Scanning</title><addtitle>Scanning</addtitle><description>This article reviews the patterning of the polymer via scanning probe lithography (SPL). Several different lithographies are characterized by the source of the patterned material, whether a mechanical, electrical, or thermal field is used, and whether the lithography modifies morphology, functionality, or both. The merits of the different strategies are discussed with respect to the fabrication goals. SCANNING 30: 000–000, 2008. © 2008 Wiley Periodicals, Inc.</description><subject>atomic force microscopy</subject><subject>polymers</subject><subject>scanning probe lithography</subject><issn>0161-0457</issn><issn>1932-8745</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNqF0E1v1DAQBmALUdFt4cAfQD4hcUjrz8ThVi3dgrQtFV2Jo-XEk12DE2_trNr8e1x2CyfEaaSZZ97Di9BbSs4oIew8teaMEaLECzSjNWeFqoR8iWaElrQgQlbH6CSlHyTbWtFX6JiqzCUvZwjuWjMMbljj2xgawEs3bsI6mu1mwqHDt8FPPcT0Ea-M8yE-wesQt5vgw3rCZrB4sRva0YXBeDfmzYjHDeAbM4QeRog453t4jY464xO8OcxTtFpcruafi-XXqy_zi2XR8pqJoja2tJSxjlnWSaLAtE0tZWuFbKTq6so2tWI8X6uqkcBqKhpLrQXBTacoP0Xv97HbGO53kEbdu9SC92aAsEu6IkIpStV_IWel4JSRDD_sYRtDShE6vY2uN3HSlOin7nXuXv_uPtt3h9Bd04P9Kw9lZ3C-Bw_Ow_TvJH03v3iOLPYfLo3w-OfDxJ-6rHgl9febK82-VZ8WsrzWiv8C3S-dVw</recordid><startdate>200803</startdate><enddate>200803</enddate><creator>Lee, Woo-Kyung</creator><creator>Sheehan, Paul E.</creator><general>Wiley Subscription Services, Inc., A Wiley Company</general><scope>BSCLL</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>7X8</scope></search><sort><creationdate>200803</creationdate><title>Scanning Probe Lithography of Polymers: Tailoring Morphology and Functionality at the Nanometer Scale</title><author>Lee, Woo-Kyung ; Sheehan, Paul E.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3924-9ad6d122f2d2f508eacb955cd45b58f97db98232d277b5e2914bd1dde43af813</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>atomic force microscopy</topic><topic>polymers</topic><topic>scanning probe lithography</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lee, Woo-Kyung</creatorcontrib><creatorcontrib>Sheehan, Paul E.</creatorcontrib><collection>Istex</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>MEDLINE - Academic</collection><jtitle>Scanning</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lee, Woo-Kyung</au><au>Sheehan, Paul E.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Scanning Probe Lithography of Polymers: Tailoring Morphology and Functionality at the Nanometer Scale</atitle><jtitle>Scanning</jtitle><addtitle>Scanning</addtitle><date>2008-03</date><risdate>2008</risdate><volume>30</volume><issue>2</issue><spage>172</spage><epage>183</epage><pages>172-183</pages><issn>0161-0457</issn><eissn>1932-8745</eissn><abstract>This article reviews the patterning of the polymer via scanning probe lithography (SPL). Several different lithographies are characterized by the source of the patterned material, whether a mechanical, electrical, or thermal field is used, and whether the lithography modifies morphology, functionality, or both. The merits of the different strategies are discussed with respect to the fabrication goals. SCANNING 30: 000–000, 2008. © 2008 Wiley Periodicals, Inc.</abstract><cop>San Francisco</cop><pub>Wiley Subscription Services, Inc., A Wiley Company</pub><pmid>18200536</pmid><doi>10.1002/sca.20084</doi><tpages>12</tpages></addata></record>
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source Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Alma/SFX Local Collection
subjects atomic force microscopy
polymers
scanning probe lithography
title Scanning Probe Lithography of Polymers: Tailoring Morphology and Functionality at the Nanometer Scale
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T15%3A06%3A45IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Scanning%20Probe%20Lithography%20of%20Polymers:%20Tailoring%20Morphology%20and%20Functionality%20at%20the%20Nanometer%20Scale&rft.jtitle=Scanning&rft.au=Lee,%20Woo-Kyung&rft.date=2008-03&rft.volume=30&rft.issue=2&rft.spage=172&rft.epage=183&rft.pages=172-183&rft.issn=0161-0457&rft.eissn=1932-8745&rft_id=info:doi/10.1002/sca.20084&rft_dat=%3Cproquest_cross%3E32643120%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=32643120&rft_id=info:pmid/18200536&rfr_iscdi=true