Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusin...
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Veröffentlicht in: | Small (Weinheim an der Bergstrasse, Germany) Germany), 2008-02, Vol.4 (2), p.182-185 |
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Format: | Artikel |
Sprache: | eng |
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