Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface

A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusin...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2008-02, Vol.4 (2), p.182-185
Hauptverfasser: Kim, Tae-il, Baek, Chang hoon, Suh, Kahp Y., Seo, Soon-min, Lee, Hong H.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!