Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface

Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface

A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusin...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2008-02, Vol.4 (2), p.182-185
Hauptverfasser: Kim, Tae-il, Baek, Chang hoon, Suh, Kahp Y., Seo, Soon-min, Lee, Hong H.
Format: Artikel
Sprache:eng
Schlagworte:
Hydrophobic and Hydrophilic Interactions
Metals
Microscopy, Electron, Scanning
nanolenses
nanolithography
nanostructures
Nanotechnology - methods
Optics and Photonics
Photography
printing
superhydrophobicity
Surface Properties
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Beschreibung
Zusammenfassung:A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200700882