Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers

Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers

Nanopatterns: The feasibility of a new lithographic technique, chemical lithography with self‐assembled monolayers (SAMs) of commercially available aliphatic compounds as resist materials, is demonstrated by the fabrication of polymer nanopatterns (see image). The technique is based on an irradiatio...

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Veröffentlicht in:Angewandte Chemie (International ed.) 2008-02, Vol.47 (8), p.1421-1424
Hauptverfasser: Ballav, Nirmalya, Schilp, Soeren, Zharnikov, Michael
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Sprache:eng
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electron beams
lithography
monolayers
polymer brushes
self-assembly
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container_title Angewandte Chemie (International ed.)
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creator Ballav, Nirmalya
Schilp, Soeren
Zharnikov, Michael
description Nanopatterns: The feasibility of a new lithographic technique, chemical lithography with self‐assembled monolayers (SAMs) of commercially available aliphatic compounds as resist materials, is demonstrated by the fabrication of polymer nanopatterns (see image). The technique is based on an irradiation‐promoted exchange reaction. Patterning requires a much lower dose than electron‐beam chemical lithography with aromatic SAMs as resists.
doi_str_mv 10.1002/anie.200704105
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source Wiley Online Library Journals Frontfile Complete
subjects electron beams
lithography
monolayers
polymer brushes
self-assembly
title Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers
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