Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers

Nanopatterns: The feasibility of a new lithographic technique, chemical lithography with self‐assembled monolayers (SAMs) of commercially available aliphatic compounds as resist materials, is demonstrated by the fabrication of polymer nanopatterns (see image). The technique is based on an irradiation‐promoted exchange reaction. Patterning requires a much lower dose than electron‐beam chemical lithography with aromatic SAMs as resists.