Biased surface fluctuations due to current stress

Direct correlation between temporal structural fluctuations and electron wind force is demonstrated, for the first time, by STM imaging and analysis of atomically resolved motion on a thin film surface under large applied current (10(5) A/cm2). The magnitude of the momentum transfer between current...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Physical review letters 2007-11, Vol.99 (20), p.206801-206801, Article 206801
Hauptverfasser: Bondarchuk, O, Cullen, W G, Degawa, M, Williams, E D, Bole, T, Rous, P J
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Direct correlation between temporal structural fluctuations and electron wind force is demonstrated, for the first time, by STM imaging and analysis of atomically resolved motion on a thin film surface under large applied current (10(5) A/cm2). The magnitude of the momentum transfer between current carriers and the geometrically constrained atoms in the fluctuating structure is at least 5x to 15x (+/-1sigma range) larger than for freely diffusing adatoms. Corresponding changes in surface resistivity will contribute significant fluctuation signature to nanoscale electronic properties.
ISSN:0031-9007
1079-7114
DOI:10.1103/physrevlett.99.206801