Wafer-scale Reduced Graphene Oxide Films for Nanomechanical Devices

We report a process to form large-area, few-monolayer graphene oxide films and then recover the outstanding mechanical properties found in graphene to fabricate high Young’s modulus ( = 185 GPa), low-density nanomechanical resonators. Wafer-scale films as thin as 4 nm are sufficiently robust that th...

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Veröffentlicht in:Nano letters 2008-10, Vol.8 (10), p.3441-3445
Hauptverfasser: Robinson, Jeremy T, Zalalutdinov, Maxim, Baldwin, Jeffrey W, Snow, Eric S, Wei, Zhongqing, Sheehan, Paul, Houston, Brian H
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Sprache:eng
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Zusammenfassung:We report a process to form large-area, few-monolayer graphene oxide films and then recover the outstanding mechanical properties found in graphene to fabricate high Young’s modulus ( = 185 GPa), low-density nanomechanical resonators. Wafer-scale films as thin as 4 nm are sufficiently robust that they can be delaminated intact and resuspended on a bed of pillars or field of holes. From these films, we demonstrate radio frequency resonators with quality factors (up to 4000) and figures of merit (f × Q > 1011) well exceeding those of pure graphene resonators reported to date. These films’ ability to withstand high in-plane tension (up to 5 N/m) as well as their high Q-values reveals that film integrity is enhanced by platelet-platelet bonding unavailable in pure graphite.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl8023092