Light intensification modeling of coating inclusions irradiated at 351 and 1053 nm

Electric-field modeling provides insight into the laser damage resistance potential of nodular defects. The laser-induced damage threshold for high-reflector coatings is 13x lower at the third harmonic (351 nm) than at the first harmonic (1053 nm) wavelength. Linear and multiphoton absorption increa...

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Veröffentlicht in:Applied Optics 2008-05, Vol.47 (13), p.C162-C166
Hauptverfasser: Stolz, Christopher J, Hafeman, Scott, Pistor, Thomas V
Format: Artikel
Sprache:eng
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Zusammenfassung:Electric-field modeling provides insight into the laser damage resistance potential of nodular defects. The laser-induced damage threshold for high-reflector coatings is 13x lower at the third harmonic (351 nm) than at the first harmonic (1053 nm) wavelength. Linear and multiphoton absorption increases with decreasing wavelength, leading to a lower-third harmonic laser resistance. Electric-field effects can also be a contributing mechanism to the lower laser resistance with decreasing wavelength. For suitably large inclusions, the nodule behaves as a microlens. The diffraction-limited spot size decreases with wavelength, resulting in an increase in intensity. Comparison of electric-field finite-element simulations illustrates a 3x to 16x greater light intensification at the shorter wavelength.
ISSN:1559-128X
0003-6935
1539-4522
DOI:10.1364/AO.47.00C162