Light intensification modeling of coating inclusions irradiated at 351 and 1053 nm
Electric-field modeling provides insight into the laser damage resistance potential of nodular defects. The laser-induced damage threshold for high-reflector coatings is 13x lower at the third harmonic (351 nm) than at the first harmonic (1053 nm) wavelength. Linear and multiphoton absorption increa...
Gespeichert in:
Veröffentlicht in: | Applied Optics 2008-05, Vol.47 (13), p.C162-C166 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Electric-field modeling provides insight into the laser damage resistance potential of nodular defects. The laser-induced damage threshold for high-reflector coatings is 13x lower at the third harmonic (351 nm) than at the first harmonic (1053 nm) wavelength. Linear and multiphoton absorption increases with decreasing wavelength, leading to a lower-third harmonic laser resistance. Electric-field effects can also be a contributing mechanism to the lower laser resistance with decreasing wavelength. For suitably large inclusions, the nodule behaves as a microlens. The diffraction-limited spot size decreases with wavelength, resulting in an increase in intensity. Comparison of electric-field finite-element simulations illustrates a 3x to 16x greater light intensification at the shorter wavelength. |
---|---|
ISSN: | 1559-128X 0003-6935 1539-4522 |
DOI: | 10.1364/AO.47.00C162 |