Fabrication of Nanopores in Silicon Chips Using Feedback Chemical Etching

Silicon nanopores (see image) are fabricated by feedback chemical etching. The electric current through a silicon chip separating a standard buffer from an etchant is monitored in the etching process such that the size of the nanopore can be controlled. This approach offers a simple method of fabric...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2007-01, Vol.3 (1), p.116-119
Hauptverfasser: Park, Sang Ryul, Peng, Hongbo, Ling, Xinsheng S.
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Peng, Hongbo
Ling, Xinsheng S.
description Silicon nanopores (see image) are fabricated by feedback chemical etching. The electric current through a silicon chip separating a standard buffer from an etchant is monitored in the etching process such that the size of the nanopore can be controlled. This approach offers a simple method of fabricating solid‐state nanopores for detecting and characterizing biomolecules.
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subjects biosensors
chemical etching
Crystallization - methods
electrochemical methods
Electrochemistry - methods
Macromolecular Substances - chemistry
Materials Testing
Molecular Conformation
nanopores
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
Particle Size
Porosity
silicon
Silicon - chemistry
Surface Properties
title Fabrication of Nanopores in Silicon Chips Using Feedback Chemical Etching
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