F2-laser-machined submicrometer gratings in thin dielectric films for resonant grating waveguide applications

Surface-relief gratings with submicrometer modulation periods were ablated by F2-laser radiation in thin metal-oxide films to produce resonant grating waveguide structures. For 150 nm films of Nb2O5, grating amplitudes in the range of 5-50 nm could be reproducibly excised with a controlled exposure...

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Veröffentlicht in:Applied optics (2004) 2006-09, Vol.45 (25), p.6586-6590
Hauptverfasser: Bader, Mark Andreas, Kappel, Christoph, Selle, André, Ihlemann, Jürgen, Ng, Mi Li, Herman, Peter R
Format: Artikel
Sprache:eng
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Zusammenfassung:Surface-relief gratings with submicrometer modulation periods were ablated by F2-laser radiation in thin metal-oxide films to produce resonant grating waveguide structures. For 150 nm films of Nb2O5, grating amplitudes in the range of 5-50 nm could be reproducibly excised with a controlled exposure of a laser energy density and a number of pulses within a narrow processing window. Resonant coupling of 800 nm ultrashort pulsed laser light into the resulting grating waveguide structure is verified with reflection and transmission spectra and satisfactorily modeled by coupled-mode theory. The laser-fabricated grating waveguides are attractive for high damage threshold reflectors and biosensor applications.
ISSN:1559-128X
DOI:10.1364/AO.45.006586