F2-laser-machined submicrometer gratings in thin dielectric films for resonant grating waveguide applications
Surface-relief gratings with submicrometer modulation periods were ablated by F2-laser radiation in thin metal-oxide films to produce resonant grating waveguide structures. For 150 nm films of Nb2O5, grating amplitudes in the range of 5-50 nm could be reproducibly excised with a controlled exposure...
Gespeichert in:
Veröffentlicht in: | Applied optics (2004) 2006-09, Vol.45 (25), p.6586-6590 |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Surface-relief gratings with submicrometer modulation periods were ablated by F2-laser radiation in thin metal-oxide films to produce resonant grating waveguide structures. For 150 nm films of Nb2O5, grating amplitudes in the range of 5-50 nm could be reproducibly excised with a controlled exposure of a laser energy density and a number of pulses within a narrow processing window. Resonant coupling of 800 nm ultrashort pulsed laser light into the resulting grating waveguide structure is verified with reflection and transmission spectra and satisfactorily modeled by coupled-mode theory. The laser-fabricated grating waveguides are attractive for high damage threshold reflectors and biosensor applications. |
---|---|
ISSN: | 1559-128X |
DOI: | 10.1364/AO.45.006586 |