Optical properties of fluoride thin films deposited by RF magnetron sputtering

Optical properties of fluoride thin films deposited by RF magnetron sputtering

Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.

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Veröffentlicht in:Applied Optics 2006-07, Vol.45 (19), p.4598-4602
Hauptverfasser: Iwahori, Koichiro, Furuta, Masahiro, Taki, Yusuke, Yamamura, Tomoyuki, Tanaka, Akira
Format: Artikel
Sprache:eng
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Zusammenfassung:Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.
ISSN:1559-128X
0003-6935
1539-4522
DOI:10.1364/AO.45.004598