Layer-in-Layer Hierarchical Nanostructures Fabricated by Combining Holographic Polymerization and Block Copolymer Self-Assembly

Layer-in-Layer Hierarchical Nanostructures Fabricated by Combining Holographic Polymerization and Block Copolymer Self-Assembly

We report the combination of top-down and bottom-up nanomanufacturing techniques to fabricate active, hierarchically structured volume reflection gratings. Holographic polymerization (H-P) formed lamellar structures of ∼200 nm in thickness, confining a block copolymer (BCP) to ∼100 nm domains. Subse...

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Veröffentlicht in:Nano Letters 2007-10, Vol.7 (10), p.3128-3133
Hauptverfasser: Birnkrant, Michael J, Li, Christopher Y, Natarajan, Lalgudi V, Tondiglia, Vincent P, Sutherland, Richard L, Lloyd, Pamela F, Bunning, Timothy J
Format: Artikel
Sprache:eng
Schlagworte:
Condensed matter: structure, mechanical and thermal properties
COPOLYMERS
Cross-disciplinary physics: materials science
rheology
Crystallization - methods
Exact sciences and technology
Holography - methods
LAMELLAE
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
Macromolecular Substances - chemistry
Materials science
Materials Testing
Methods of nanofabrication
Molecular Conformation
NANOSCIENCE AND NANOTECHNOLOGY
NANOSTRUCTURES
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
national synchrotron light source
Particle Size
Physics
POLYMERIZATION
Polymers - chemistry
REFLECTION
Self-assembly
Surface Properties
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
THICKNESS
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Beschreibung
Zusammenfassung:We report the combination of top-down and bottom-up nanomanufacturing techniques to fabricate active, hierarchically structured volume reflection gratings. Holographic polymerization (H-P) formed lamellar structures of ∼200 nm in thickness, confining a block copolymer (BCP) to ∼100 nm domains. Subsequently, the BCP self-assembles into nanolayers with a period of ∼21 nm. We envisage that this approach opens a gateway to fabricating hierarchical nanostructures at different length scales.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl071673j