Photoreversibly Switchable Superhydrophobic Surface with Erasable and Rewritable Pattern

We report the facile fabrication of a functional nanoporous multilayer film with wettability that is reversibly tunable between superhydrophobicity and superhydrophilicity with UV/visible irradiation. Our approach controls surface roughness with an electrostatic self-assembly process and makes use o...

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Veröffentlicht in:Journal of the American Chemical Society 2006-11, Vol.128 (45), p.14458-14459
Hauptverfasser: Lim, Ho Sun, Han, Joong Tark, Kwak, Donghoon, Jin, Meihua, Cho, Kilwon
Format: Artikel
Sprache:eng
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Zusammenfassung:We report the facile fabrication of a functional nanoporous multilayer film with wettability that is reversibly tunable between superhydrophobicity and superhydrophilicity with UV/visible irradiation. Our approach controls surface roughness with an electrostatic self-assembly process and makes use of the photoresponsive molecular switching of fluorinated azobenzene molecules. Selective UV irradiation onto the nanostructured substrate was used to realize substrates with erasable and rewritable patterns of extreme wetting properties. Our findings will open up new avenues for external stimuli-responsive smart surfaces.
ISSN:0002-7863
1520-5126
DOI:10.1021/ja0655901