Dual Layer and Multilayer Enhancements from Silver Film over Nanostructured Surface-Enhanced Raman Substrates

Novel dual layer and multilayer silver film over nanostructure (SFON) substrates have been developed that provide surface-enhanced Raman scattering (SERS) signal enhancements of greater than 1000% compared to conventional single layer SFON substrates. These substrates provide signal enhancement fact...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied spectroscopy 2005-04, Vol.59 (4), p.410-417
Hauptverfasser: Li, Honggang, Cullum, Brian M.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Novel dual layer and multilayer silver film over nanostructure (SFON) substrates have been developed that provide surface-enhanced Raman scattering (SERS) signal enhancements of greater than 1000% compared to conventional single layer SFON substrates. These substrates provide signal enhancement factors of 3.8 × 105 and greater for a variety of SERS active analytes. Substrate preparation is accomplished by vapor depositing a thick (∼100 nm) layer of silver on top of an underlying layer of alumina nanoparticles, followed by deposition of additional layers of silver with silver oxide layers between them. Unlike previous dual layer silver island based substrates that have been developed, these substrates do not rely on achieving an optimal morphology via deposition of silver. Instead, these substrates rely on the roughness being provided by the original under-layer, providing enhanced substrate homogeneity and more reproducible signals than either silver island substrates or colloidal substrates. In addition, the signal enhancement gives these substrates extended lifetimes compared to conventional single layer SFON substrates. Finally, this study also shows that geometric surface structure and surface roughness factors play little or no role in this enhancement process, allowing for this multilayer fabrication process to be applied to many different types of substrates achieving similar or even greater results.
ISSN:0003-7028
1943-3530
DOI:10.1366/0003702053641379