Imprinting the Optical Near Field of Microstructures with Nanometer Resolution

Imprinting the Optical Near Field of Microstructures with Nanometer Resolution

The imaging of complex 2D near‐field patterns imprinted on photosensitive films resulting from interference between laser light and light scattered by dielectric microspheres is demonstrated (see image). Using chalcogenide films, the imprint produces optical, electrical, and topographical contrast a...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2009-08, Vol.5 (16), p.1825-1829
Hauptverfasser: Kühler, P., García de Abajo, F. J., Solis, J., Mosbacher, M., Leiderer, P., Afonso, C.N., Siegel, J.
Format: Artikel
Sprache:eng
Schlagworte:
chalcogenides
data storage
Equipment Design
Lasers
Light
Microscopy - methods
nanoparticles
Nanoparticles - chemistry
nanopatterning
Nanotechnology - methods
Normal Distribution
Optics and Photonics
Scattering, Radiation
Silicon Dioxide - chemistry
Surface Properties
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Zusammenfassung:The imaging of complex 2D near‐field patterns imprinted on photosensitive films resulting from interference between laser light and light scattered by dielectric microspheres is demonstrated (see image). Using chalcogenide films, the imprint produces optical, electrical, and topographical contrast and allows the writing of erasable features as small as 10 nm. The technique is directly applicable to any type of scattering particle (size, shape, and material)
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200900393