Nanoscale Forces and Their Uses in Self-Assembly

The ability to assemble nanoscopic components into larger structures and materials depends crucially on the ability to understand in quantitative detail and subsequently “engineer” the interparticle interactions. This Review provides a critical examination of the various interparticle forces (van de...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2009-07, Vol.5 (14), p.1600-1630
Hauptverfasser: Bishop, Kyle J. M., Wilmer, Christopher E., Soh, Siowling, Grzybowski, Bartosz A.
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Sprache:eng
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Zusammenfassung:The ability to assemble nanoscopic components into larger structures and materials depends crucially on the ability to understand in quantitative detail and subsequently “engineer” the interparticle interactions. This Review provides a critical examination of the various interparticle forces (van der Waals, electrostatic, magnetic, molecular, and entropic) that can be used in nanoscale self‐assembly. For each type of interaction, the magnitude and the length scale are discussed, as well as the scaling with particle size and interparticle distance. In all cases, the discussion emphasizes characteristics unique to the nanoscale. These theoretical considerations are accompanied by examples of recent experimental systems, in which specific interaction types were used to drive nanoscopic self‐assembly. Overall, this Review aims to provide a comprehensive yet easily accessible resource of nanoscale‐specific interparticle forces that can be implemented in models or simulations of self‐assembly processes at this scale. This Review provides a critical examination of the various interparticle forces (van der Waals, electrostatic, magnetic, molecular, and entropic) that can be used in nanoscale self‐assembly. The magnitudes and length scales of each force (see image) are discussed, with emphasis on characteristics unique to the nanoscale. Recent experimental systems, in which specific interaction types were used to drive nanoscopic self‐assembly, accompany the theoretical discussion.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200900358