A simple electron-beam lithography system
A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the co...
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Veröffentlicht in: | Ultramicroscopy 2005-02, Vol.102 (3), p.215-219 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50×50
μm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10
nm. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. |
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ISSN: | 0304-3991 1879-2723 |
DOI: | 10.1016/j.ultramic.2004.09.011 |