A simple electron-beam lithography system

A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the co...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Ultramicroscopy 2005-02, Vol.102 (3), p.215-219
Hauptverfasser: Mølhave, Kristian, Madsen, Dorte Nørgaard, Bøggild, Peter
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50×50 μm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 nm. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition.
ISSN:0304-3991
1879-2723
DOI:10.1016/j.ultramic.2004.09.011