Atmospheric Pressure Chemical Vapor Deposition: An Alternative Route to Large-Scale MoS2 and WS2 Inorganic Fullerene-like Nanostructures and Nanoflowers

Large‐scale MoS2 and WS2 inorganic fullerene‐like (IF) nanostructures (onionlike nanoparticles, nanotubes) and elegant three‐dimensional nanoflowers (NF) have been selectively prepared through an atmospheric pressure chemical vapor deposition (APCVD) process with the reaction of chlorides and sulfur. The morphologies were controlled by adjusting the deposition position, the deposition temperature, and the flux of the carrier gas. All of the nanostructures have been characterized by X‐ray powder diffraction (XRD), transmission electron microscopy (TEM), and scanning electron microscopy (SEM). A reaction mechanism is proposed based on the experimental results. The surface area of MoS2 IF nanoparticles and the field‐emission effect of as‐prepared WS2 nanoflowers is reported. Inorganic fullerene‐like (IF) nanostructures and elegant three‐dimensional nanoflowers of MoS2 and WS2 have been selectively prepared on a large‐scale by means of an atmospheric pressure chemical vapor deposition (APCVD) process with the reaction of chlorides and sulfur (see figure). The reaction mechanism is proposed based on the experimental facts. The surface areas of MoS2 IF nanoparticles and field‐emission properties of as‐synthesized WS2 nanoflowers are reported.