Effect of surface manufacturing error of cubic phase mask in wavefront coding system

The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (P...

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Veröffentlicht in:	Optics express 2009-04, Vol.17 (8), p.6245-6251
Hauptverfasser:	Chang, Chuan-Chung, Lee, Cheng-Chung
Format:	Artikel
Sprache:	eng
Schlagworte:	Computer Simulation Computer-Aided Design Equipment Design Equipment Failure Analysis Lenses Light Models, Theoretical Reproducibility of Results Scattering, Radiation Sensitivity and Specificity
Online-Zugang:	Volltext
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