Effect of surface manufacturing error of cubic phase mask in wavefront coding system

Effect of surface manufacturing error of cubic phase mask in wavefront coding system

The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (P...

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Veröffentlicht in:Optics express 2009-04, Vol.17 (8), p.6245-6251
Hauptverfasser: Chang, Chuan-Chung, Lee, Cheng-Chung
Format: Artikel
Sprache:eng
Schlagworte:
Computer Simulation
Computer-Aided Design
Equipment Design
Equipment Failure Analysis
Lenses
Light
Models, Theoretical
Reproducibility of Results
Scattering, Radiation
Sensitivity and Specificity
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Zusammenfassung:The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (PV) error of the cubic surface is needed smaller than 15% compare with the sag of the cubic surface for low period error existed.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.17.006245