Cobalt Nanoparticle Arrays made by Templated Solid-State Dewetting

Self‐assembled cobalt particle arrays are formed by annealing, which cause agglomeration (dewetting) of thin Co films on oxidized silicon substrates that are topographically prepatterned with an array of 200‐nm‐period pits. The Co nanoparticle size and uniformity are related to the initial film thickness, annealing temperature, and template geometry. One particle per 200‐nm‐period pit is formed from a 15‐nm film annealed at 850 °C; on a smooth substrate, the same annealing process forms particles with an average interparticle distance of 200 nm. Laser annealing enables templated dewetting of 5‐nm‐thick films to give one particle per pit. Although the as‐deposited films exhibit a mixture of hexagonal close‐packed and face‐centered cubic (fcc) phases, the ordered cobalt particles are predominantly twinned fcc crystals with weak magnetic anisotropy. Templated dewetting is shown to provide a method for forming arrays of nanoparticles with well‐controlled sizes and positions. Keeping order: Annealing of a Co film deposited on a topographical substrate with 200‐nm‐period pits leads to well‐ordered arrays of magnetic islands (see image). The Co nanoparticle size and uniformity are related to the initial film thickness, annealing temperature, and template geometry.