A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching

A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching

A method for decreasing the lateral size of conducting polymer patterns is demonstrated. Up to 15–70% shrinkage can be achieved based on nanoimprint lithography and isotropic plasma etching (see image). The conducting polymer patterns can direct the assembly of silver nanoparticles. This is a simple...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2009-03, Vol.5 (5), p.583-586
Hauptverfasser: Huang, Chunyu, Dong, Bin, Lu, Nan, Yang, Bingjie, Gao, Liguo, Tian, Lu, Qi, Dianpeng, Wu, Qiong, Chi, Lifeng
Format: Artikel
Sprache:eng
Schlagworte:
conducting polymers
Crystallization - methods
Electric Conductivity
Electrochemistry - methods
Gases - chemistry
Hot Temperature
isotropic plasma etching
Macromolecular Substances - chemistry
Materials Testing
Molecular Conformation
nanoimprint lithography
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
Particle Size
patterning
Photography - methods
Polymers - chemistry
Surface Properties
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Zusammenfassung:A method for decreasing the lateral size of conducting polymer patterns is demonstrated. Up to 15–70% shrinkage can be achieved based on nanoimprint lithography and isotropic plasma etching (see image). The conducting polymer patterns can direct the assembly of silver nanoparticles. This is a simple route for patterning high‐resolution conducting polymers.
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200801197