Ultra-Low Shrinkage Hybrid Photosensitive Material for Two-Photon Polymerization Microfabrication

Investigations into the structuring by two-photon polymerization of a nonshrinking, photosensitive, zirconium sol−gel material are presented. This hybrid material can be photostructured even when it contains up to 30 mol % of zirconium propoxide (ZPO); by varying the material’s inorganic content, it...

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Veröffentlicht in:ACS nano 2008-11, Vol.2 (11), p.2257-2262
Hauptverfasser: Ovsianikov, Aleksandr, Viertl, Jacques, Chichkov, Boris, Oubaha, Mohamed, MacCraith, Brian, Sakellari, Ioanna, Giakoumaki, Anastasia, Gray, David, Vamvakaki, Maria, Farsari, Maria, Fotakis, Costas
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Sprache:eng
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Zusammenfassung:Investigations into the structuring by two-photon polymerization of a nonshrinking, photosensitive, zirconium sol−gel material are presented. This hybrid material can be photostructured even when it contains up to 30 mol % of zirconium propoxide (ZPO); by varying the material’s inorganic content, it is possible to modify and tune its refractive index. The introduction of ZPO significantly increases the photosensitivity of the resulting photopolymer. The fabricated three-dimensional photonic crystal structures demonstrate high resolution and a clear band-stop in the near-IR region. In contrast to common practice, no additional effort is required to precompensate for shrinkage or to improve the structural stability of the fabricated photonic crystals; this, combined with the possibility of tuning this material’s optical, mechanical, and chemical properties, makes it suitable for a variety of applications by two-photon polymerization manufacturing.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn800451w