RF-plasma polymerization and characterization of polyaniline

Suitable modifications are done in a RF sputtering set up to facilitate synthesis of polyaniline thin film by RF-plasma polymerization process. The films prepared are highly cross-linked, amorphous in nature and have band gap of 2.07 eV. SEM images show the uniformity in film morphology. The refract...

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Veröffentlicht in:European polymer journal 2009-10, Vol.45 (10), p.2873-2877
Hauptverfasser: Lakshmi, G.B.V.S., Dhillon, Anju, Siddiqui, Azher M., Zulfequar, M., Avasthi, D.K.
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Sprache:eng
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Zusammenfassung:Suitable modifications are done in a RF sputtering set up to facilitate synthesis of polyaniline thin film by RF-plasma polymerization process. The films prepared are highly cross-linked, amorphous in nature and have band gap of 2.07 eV. SEM images show the uniformity in film morphology. The refractive index of the films is determined to be 1.11 and dielectric constant is 1.12 at a wavelength 620 nm in the visible region. Suitable modifications are done in a RF sputtering set up to facilitate synthesis of polyaniline thin film by RF-plasma polymerization process. The synthesized films are characterized by FTIR, XRD, Ellipsometry, UV–visible absorption & reflection and SEM. The films prepared are highly cross-linked, amorphous in nature and have band gap of 2.07 eV. SEM images show the uniformity in film morphology. The refractive index of the films is determined to be 1.11 and dielectric constant is 1.12 at a wavelength 620 nm in the visible region.
ISSN:0014-3057
1873-1945
DOI:10.1016/j.eurpolymj.2009.06.027