Analysis of Cu segregation to oxide-metal interface of Ni-based alloy in a metal-dusting environment

Hard X‐ray photoelectron spectroscopy (HX‐PES) has been realized using high‐brilliance synchrotron radiation. High‐energy photon excitation enables us to probe photoelectrons with larger escape depth compared to conventional PES. This allows us to conduct, without destruction, a study of the embedde...

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Veröffentlicht in:	Surface and interface analysis 2008-10, Vol.40 (10), p.1374-1381
Hauptverfasser:	Doi, Takashi, Kitamura, Kazuyuki, Nishiyama, Yoshitaka, Otsuka, Nobuo, Kudo, Takeo, Sato, Masugu, Ikenaga, Eiji, Ueda, Shigenori, Kobayashi, Keisuke
Format:	Artikel
Sprache:	eng
Schlagworte:	Composition defects and impurities Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cu segregation Electron and ion emission by liquids and solids impact phenomena Exact sciences and technology HX-PES Interface structure and roughness metal dusting Photoemission and photoelectron spectra Physics Solid surfaces and solid-solid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties)
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Zusammenfassung:	Hard X‐ray photoelectron spectroscopy (HX‐PES) has been realized using high‐brilliance synchrotron radiation. High‐energy photon excitation enables us to probe photoelectrons with larger escape depth compared to conventional PES. This allows us to conduct, without destruction, a study of the embedded interface of materials as the oxide‐ metal interface. We apply HX‐PES to investigate for Cu segregation in the oxide–metal interface during metal‐dusting corrosion. The effective concentration of Cu in the segregation was estimated a few times higher than the bulk concentration. These results on the interface layer can explain the variation in the corrosion resistance. Copyright © 2008 John Wiley & Sons, Ltd.
ISSN:	0142-2421 1096-9918
DOI:	10.1002/sia.2910