A high brightness source for nano-probe secondary ion mass spectrometry

The two most prevalent ion source technologies in the field of surface analysis and surface machining are the Duoplasmatron and the liquid metal ion source (LMIS). There have been many efforts in this area of research to develop an alternative source [ S.K. Guharay, J. Orloff, M. Wada, IEEE Trans. Plasma Sci. 33 (6) (2005) 1911; N.S. Smith, W.P. Skoczylas, S.M. Kellogg, D.E. Kinion, P.P. Tesch, O. Sutherland, A. Aanesland, R.W. Boswell, J. Vac. Sci. Technol. B 24 (6) (2006) 2902–2906] with the brightness of a LMIS and yet the ability to produce secondary ion yield enhancing species such as oxygen. However, to date a viable alternative has not been realized. The high brightness and small virtual source size of the LMIS are advantageous for forming high resolution probes but a significant disadvantage when beam currents in excess of 100 nA are required, due to the effects of spherical aberration from the optical column. At these higher currents a source with a high angular intensity is optimal and in fact the relatively moderate brightness of today's plasma ion sources prevail in this operating regime. Both the LMIS and Duoplasmatron suffer from a large axial energy spread resulting in further limitations when forming focused beams at the chromatic limit where the figure-of-merit is inversely proportional to the square of the energy spread. Also, both of these ion sources operate with a very limited range of ion species. This article reviews some of the latest developments and some future potential in this area of instrument development. Here we present an approach to source development that could lead to oxygen ion beam SIMS imaging with 10 nm resolution, using a ‘broad area’ RF gas phase ion source.