Density Investigation by X-ray Reflectivity for Thin Films Synthesized Using Atmospheric CVD

The density of hafnia and titania films is investigated by an X‐ray reflectivity (XRR) analysis using an X‐ray diffractometer equipped with a relatively low power X‐ray source. Several films are prepared using a CVD technique operated under atmospheric pressure. The XRR profile of the hafnia films is obtained, and fitted with the assumption of the existence of an HfSiO intermediate layer on the Si substrate with a SiO2 layer. The density of the hafnia films is lower than that of the bulk crystal. On the other hand, the XRR profile of the titania films on the glass substrate can be fitted using a seven‐lamella model. The film density of titania is also lower than that of the bulk crystal. XRR analysis may become a powerful weapon to determine not only the structure model but also the crystallinity of each layer. Full Paper: The density of oxide films was investigated by the XRR analysis. The samples were prepared using the CVD technique operated under atmosphere. The XRR profile of the hafnia films was fitted with the four‐layer model that includes HfSiO and SiO2 layers. On the other hand, the XRR profile of the titania films was fitted using the seven‐lamella model constructed by titania only. The density of hafnia and titania film was lower than that of bulk crystal. The XRR analysis may become powerful weapon to determine the structure model and density of each layer of the oxide film.