Characterisation of Ni and Ni/Ti contact on n-type 4H-SiC

In this work, we report on the structural characterisation of Ni and Ni/Ti bilayer contacts on n-type 4H-SiC. The redistribution of carbon, after annealing, in the Ni/SiC and the Ni/Ti/SiC contacts is particularly studied by RBS at 3.2 MeV, XRD and AES techniques.

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Bibliographische Detailangaben
Veröffentlicht in:	Applied surface science 2009-10, Vol.256 (1), p.256-260
Hauptverfasser:	Siad, M., Vargas, C. Pineda, Nkosi, M., Saidi, D., Souami, N., Daas, N., Chami, A.C.
Format:	Artikel
Sprache:	eng
Schlagworte:	AES Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Nickel Ohmic contacts Physics RBS SiC Titanium XRD
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	In this work, we report on the structural characterisation of Ni and Ni/Ti bilayer contacts on n-type 4H-SiC. The redistribution of carbon, after annealing, in the Ni/SiC and the Ni/Ti/SiC contacts is particularly studied by RBS at 3.2 MeV, XRD and AES techniques.
ISSN:	0169-4332 1873-5584
DOI:	10.1016/j.apsusc.2009.08.011