High density interconnect substrates using multilayer thin film technology on laminate substrates (MCM-SL D)
A novel interconnect technology, introducing thin film on a laminate substrate base, is presented. A specially constructed laminate board is used as a substrate for the thin film build-up process. The main characteristics of the laminate core substrate are the z-axis electrical connections, the abse...
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Veröffentlicht in: | Microelectronics international 2001-12, Vol.18 (3), p.36-42 |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | A novel interconnect technology, introducing thin film on a laminate substrate base, is presented. A specially constructed laminate board is used as a substrate for the thin film build-up process. The main characteristics of the laminate core substrate are the z-axis electrical connections, the absence of holes in the substrate and the very flat nature of the top surface. As a result, the base substrate can be processed further in a thin film processing line. The manufacturing and properties of these substrates are discussed. |
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ISSN: | 1356-5362 1758-812X |
DOI: | 10.1108/EUM0000000005830 |