High density interconnect substrates using multilayer thin film technology on laminate substrates (MCM-SL D)

A novel interconnect technology, introducing thin film on a laminate substrate base, is presented. A specially constructed laminate board is used as a substrate for the thin film build-up process. The main characteristics of the laminate core substrate are the z-axis electrical connections, the abse...

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Veröffentlicht in:Microelectronics international 2001-12, Vol.18 (3), p.36-42
Hauptverfasser: Beyne, Eric, Van Hoof, Rita, Webers, Tomas, Brebels, Steven, Rossi, Stéphanie, Lechleiter, François, Di Ianni, Marianna, Ostmann, Andreas
Format: Artikel
Sprache:eng
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Zusammenfassung:A novel interconnect technology, introducing thin film on a laminate substrate base, is presented. A specially constructed laminate board is used as a substrate for the thin film build-up process. The main characteristics of the laminate core substrate are the z-axis electrical connections, the absence of holes in the substrate and the very flat nature of the top surface. As a result, the base substrate can be processed further in a thin film processing line. The manufacturing and properties of these substrates are discussed.
ISSN:1356-5362
1758-812X
DOI:10.1108/EUM0000000005830